COMPANY ARTICLES

The following are the latest press releases from Photo Sciences, Inc. Please check back often as press releases are frequently updated.

 

COMMERCIAL PHOTOMASK AND MICRO-PATTERNING SOLUTIONS

FOR IMMEDIATE RELEASE Thursday, September 13, 2007

In September 2007 Photo Sciences successfully introduced a new process and procedure to enable commercial photomask lithography and micro patterning solutions to a range of nano scale technologies in addition to semi conductors.

Traditionally this photomask techonology and chemical milling is commonly applied to semiconductors but with Photo Sciences commercial photomask lithography and micro patterning solutions it can now be applied to a whole range of products with difficult micro-patterning challenges.

Photo Sciences photomask lithography equipment, and chemical milling processes to etch micro holes can be easily applied to a range non-semiconductor products such as optics, MEMS devices, micro-displays, RFI/EMI shielding, micro-fluidics and other nano-scale technologies.

Photo Sciences expertise often leads to micro patterning solutions for the most cutting-edge new products and technologies. Among Photo Sciences offerings are; Direct-write laser and e-beam lithography, thin film deposition of metals and broad band anti-reflective coatings, etching, micro-plating, chemical milling, micro-fabrication of patterned substrates to provide complete turnkey solutions.

 
   

PHOTO SCIENCES INTRODUCES PROPRIETARY PHOTO CHEMICAL MILLING PROCESS TO ETCH MICRO HOLES THROUGH METAL

FOR IMMEDIATE RELEASE Wednesday, October 10, 2007

In August 2007 Photo Sciences successfully introduced a new proprietary photo chemical milling process to etch micro holes through metal.

The photo chemical milling process allows Photo Sciences to etch holes as small as 2.5um completely through thin sheets of metal.  Photo Sciences uses it’s photomask technology to create tight tolerance tooling, which is then used to image and etch features through the thin metal substrates.  The etched features on Photo Sciences’ metal parts have very smooth, well-defined edges, which is uncharacteristic for most chemically milled parts.  These chemically machined metal parts have many uses and are well suited to be employed as deposition masks or as apertures for optical applications.

This chemical milling process specifically allows sub micron tolerances and complex patterns which can be combined with photo sciences in house design, CAD, and photo tooling capabilities.

This new chemical milling process also compliments the data and design provisions, mask pattern generation, inspection, measurement and repair services that Photo Sciences already offer to provide turnkey solutions.

 

  

PHOTO SCIENCES INTRODUCES NEW FAST TRACK PLUS PHOTOMASK SERVICE

FOR IMMEDIATE RELEASE Wednesday, October 10, 2007

In February 2007 Photo Sciences successfully introduced Fast Trak PLUS Photomask Service. This photomask service is a further improvement on the existing Fast Trak photomask service which utilizes machine ready data.  The key difference in the new FAST TRACK “PLUS” is that it allows customers to take advantage of the low fixed price for the laser written master photomask  and the 48 hour delivery of standard FAST TRACK photomasks but adds services such as CAD layout, mask copies or pellicles for Fast Trak PLUS clients.  There is an extra cost for these data preparation & digitization services but the complete photomask package and micro patterning solution is of great advantage to its Fast Trak Plus customers.

This new Fast Trak PLUS service compliments the data and design provisions, mask pattern generation, inspection, measurement and repair services that Photo Sciences already offer but when used  in conjunction with a fully automated Small Substrate Lithography System (SSLS) customers are able to achieve complete turnkey solutions.

 
 

PHOTO SCIENCES ADAPTS PHOTOMASK LITHOGRAPHY AND MICRO PATTERNING SOLUTIONS TO INCREASED RANGE OF NANO SCALE TECHNOLOGIES

FOR IMMEDIATE RELEASE Wednesday, October 10, 2007

In September 2007 Photo Sciences successfully introduced a new process and procedure to enable commercial photomask lithography and micro patterning solutions to a range of nano scale technologies in addition to semi conductors.

Traditionally this photomask techonology and chemical milling is commonly applied to semiconductors but with Photo Sciences commercial photomask lithography and micro patterning solutions it can now be applied to a whole range of products with difficult micro-patterning challenges. 

Photo Sciences photomask lithography equipment, and chemical milling processes to etch micro holes can be easily applied to a range non-semiconductor products such as optics, MEMS devices, micro-displays, RFI/EMI shielding, micro-fluidics and other nano-scale technologies.  

Photo Sciences expertise often leads to micro patterning solutions for the most cutting-edge new products and technologies.  Among Photo Sciences offerings are; Direct-write laser and e-beam lithography, thin film deposition of metals and broad band anti-reflective coatings, etching, micro-plating, chemical milling, micro-fabrication of patterned substrates to provide complete turnkey solutions.
   

PSI - TRANSFER DIGITAL IMAGES TO COATED SUBSTRATES WITH SUBMICRON FEATURES

Photo Sciences, Inc.  (Torrance, CA) has released a new service based on a method of transferring graphics directly from a digital image file to a more permanent material, such as glass or metal, i.e., borosilicate, quartz, soda lime, copper and nickel, among others. Coatings range from chrome and indium tin oxide (ITO) to various colored polymers.  The result is a high resolution, precision color or monochrome graphic with a multitude of applications.  Some applications include diffractive laser optics, theatrical projection, text archiving and electronic circuitry.

 

PHOTO SCIENCES, INC. ANNOUNCES ISO 9001:2000 REGISTRATION

March 22, 2004

Photo Sciences achieves ISO 9001:2000 Registration.  The announcement was made by Chatur S. Bhuj, PSI's Director of Quality Assurance.  "Obtaining ISO Registration really demonstrates PSI management's dedication to quality", Mr. Bhuj stated in a recent interview. “Passing the ISO audit lets our customers know how much we are committed to providing them with a continually improving value proposition.  From the outset, we encouraged our employees to make contributions. All PSI personnel were instructed on the ISO standard so that any employee present and in the future could recommend improvement, which has led to many achievements; one being an increased sense of pride and ownership for the products we produce. Our policy is ‘Quality first and delivery on time, every time’ -and we mean it.”

While obtaining ISO Registration is crucial, a smooth audit during registration is viewed by the entire company as the best possible way to communicate where consistency in quality is the highest standard Photo Sciences could offer its customers.

 
   

PHOTO SCIENCES RECEIVES "2004 PREFERRED SUPPLIERS" AWARD FROM ROCKWELL-COLLINS

Cedar Rapids, Iowa – April 21, 2004

Photo Sciences received a Preferred Suppliers award from Rockwell Collins for outstanding performance in producing glass parts.  Roger Horstman, PSI's leading Application Engineer, accepted the award. .   “The folks at Rockwell Collins were very appreciative of our efforts” Horstman said.  

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©2004 Photo Sciences, Inc.
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