Photo Sciences has a process and procedure for using commercial photomask lithography and micro patterning solutions to image substrates coated with Indium Tin Oxide (ITO).

New technology is demanding the etching of microscopic patterns on substrates coated with Indium Tin Oxide (ITO) because of its ability to combine electrical conductivity and optical transparency.

Photo Sciences uses its multi-faceted micro lithography capabilities to pattern Indium Tin Oxide (ITO) coated substrates using direct-write laser, direct-write e-beam, optical reduction and full field exposure lithography. The key to Photo Sciences’ proprietary micro-patterning capabilities is its ability to deposit extremely uniform thin film coatings such as Indium Tin Oxide, which is critical in the lithographic process.

Photo Sciences uses state-of-the-art measurement and test equipment to insure that the thin film coatings meet thickness and resistance specifications in its micro patterning solutions. Photo Sciences employs multi-level aligners to expose and selectively etch other thin film metals and dielectrics, which can be layered with the Indium Tin Oxide patterns to create a wide array of circuit and display configurations.

The patterned Indium Tin Oxide (ITO) substrates are mainly used to make transparent conductive coatings for liquid crystal displays, flat panel displays, plasma displays, touch panels, solar cells and EMI shieldings.

Photo Sciences uses its photomask lithography equipment, and thin film coating processes to etch micro patterns into Indium Tin Oxide coatings on various substrate materials. The transparency, temperature and conductive characteristics of Indium Tin Oxide (ITO) allows it to be useful to a whole range of nano-scale technologies and high temperature environments.