Photomask Technical Glossary
administrator2018-09-19T15:26:08+00:00A technical glossary of terms used in photomask manufacturing.
Photomask Inspection
administrator2018-08-30T18:15:27+00:00A hard defect is any flaw affecting the photomask mask, other than contamination. One class of defects includes ...
Parts of a Photomask
administrator2018-08-14T14:56:11+00:00A die is a single complete device image. A primary die (also called the primary pattern) contains the device design that is used ...
Photomasks: Photo Resist Development
administrator2018-08-01T18:21:49+00:00Photomask photo resist development is a critical step in photo resist processing because it plays a key role in defining ...
Photomask Writing
administrator2018-07-17T14:38:08+00:00The writing equipment writes the geometry onto the blank mask plate by exposing the photo resist to a UV light source, a laser or an electron beam ...
Data Preparation & Conversion
administrator2018-06-19T17:26:27+00:00Data preparation includes all of the steps that are required to insure that data is ready for the write ...
Photomasks: Intermediate Data Formats
administrator2018-06-19T17:25:50+00:00Of the three intermediate data formats, CIF data is the format least used by mask ...
Photomask Writing and Development
administrator2018-06-19T17:21:18+00:00The steps involved in a typical photomask writing and development process using ...
Photomask Quality
administrator2018-05-31T17:35:30+00:00Photomasks must be of the highest quality and must meet a wide variety of customer specifications. The photomask quality requirements are usually ...
Material Used To Make Binary Photomask
administrator2018-06-15T15:14:54+00:00There are two most common types of substrate material used for making photomasks are quartz (fused silica) and Soda Lime ...
Binary & Phase Shift Masks
administrator2018-05-31T17:38:56+00:00Photomasks can be separated into two main categories; conventional binary masks and advanced phase-shift masks. A binary mask consists of a ...
Photomask Tone
administrator2018-06-15T15:12:50+00:00Various terminologies are used to describe the tone of both pattern and background areas of a photomask.